Metal titanium and titanium sputtering target are essentially the same, both of which are composed of titanium element; the difference is that metal titanium is more like a raw material, and titanium target is more like a titanium product. Titanium as a raw material can be made into titanium sputtering targets by several methods, and they are mainly used for various coatings, such as tool coating, optics coating, solar coating, and the like. To understand titanium targets, you first need to understand titanium.
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The discovery of titanium is inseparable from the following three people:
a. Reverend William Gregor, an amateur mineralogist in England, is the first to discover titanium-containing minerals.
b. Martin Heinrich Klaproth named the element &#;Titanium&#; using the Greek word &#;Titanic&#;.
c. Matthew A. Hunter, an American chemist, used titanium to reduce TiCl to produce metal titanium with a purity of 99.9%. It was the first time that people had obtained pure titanium.
Titanium sputtering target shares the same properties with their source material. The titanium element is widely distributed (about 0.4%) in the earth&#;s crust. The world&#;s titanium reserves are about 3.4 billion tons, ranking 9th among all elements. Titanium is a material of high commercial values &#; it has been widely used in various fields, including aerospace, automobile manufacturing, medical and health, and other fields of daily life because of their high strength, good corrosion resistance, and high heat resistance. Its corrosion resistance of titanium is mainly manifested in the fact that titanium does not react with air at normal temperature. However, in the actual production environment, titanium still undergo different kinds of corrosion.
Let me give you an easy-to-understand definition of sputtering target. The word &#;target&#; in &#;titanium sputtering target&#; is derived from the shooting target, which is commonly seen in our daily life. In the process of sputtering deposition, the coating material is bombarded by electron beam or ion beam, just like the target being shot, so the material used in the sputtering process got its name as &#;sputtering target&#;.
Titanium sputtering target is a kind of titanium product made of the metal titanium, and it is used in the sputter coating to produce titanium thin film. Simply speaking, there are two methods to make titanium sputtering targets from metal titanium &#; casting and powder metallurgy.
Casting: melt the raw material of a certain distribution ratio, pour the alloy solution into a mold to form an ingot, and finally machine it to become a sputtering target. The method is smelted and cast in a vacuum.
Powder metallurgy: melt the raw material of a certain distribution ratio, cast it into an ingot and then pulverize it, isostatically press the powder, and then sintering it at a high temperature to finally form a target.
In general, when measuring whether the sputtering target meets the primary requirements, one would consider the following indicators:
Purity: Purity has a great influence on the performance of the film produced by sputter coating. Taking titanium target as an example, the higher the purity is, the better the corrosion resistance and electrical and optical properties of the sputtered film are.
Impurity content: The impurities in the solid of the target material and the oxygen and water vapor in the stoma are the main pollution sources of the deposition film. Targets for different applications have different requirements of their impurity contents.
Density: The density of the target not only affects the sputtering rate but also affects the electrical and optical properties of the film. Thus, in order to reduce pores in the solids of the target and improve the properties of the sputtered film, the target is usually required to have a higher density.
Grain size and grain size distribution: For the same target, the sputtering rate of the fine-grained target is faster than that of the coarse-grained target; and the thickness of the target sputter-deposited film with a smaller difference in grain size (distributed uniformly) is more uniform.
The above indicators are used as the basic requirements of sputtering targets. For specific requirements of titanium sputtering target in the different application, please refer to our previous article Applications and Requirements of Titanium Sputtering Target.
I really hope that this article helps you understand more about the titanium sputtering target. Here is SAM Sputter Target, a global sputtering target manufacturer. We regularly update industrial knowledge and news on our website, please visit https://www.sputtertargets.net/ for more information.
The titanium sputtering target and the aluminum sputtering target are both the sputtering materials for film coating. The titanium film is a strong, lightweight coating material that is used in many film coating applications. However, because of the price, it is often compared to aluminum film, which is also a very strong film material but less expensive.
There are many elements that affect the final choice of an application. A simple comparison of the chemical and mechanical properties of the two kinds of sputtering targets will show the differences between them and what might be better for your application.
Titanium was discovered in the late s by German chemist Martin Heinrich Klaproth, who named the metal after the Greek Titans, a clan of powerful gods and goddesses. Titanium is a very strong metal. It&#;s lighter than steel, and it can be made much thinner without sacrificing structural integrity due to its high tensile strength. Titanium is very rigid and durable, and titanium films can last decades without any sign of wear when properly cared for.
Aluminum, in contrast, is the most abundant metallic element in the earth&#;s crust. Compared with the titanium mentioned above, Aluminum was discovered much later. In , the British chemist Sir Humphry Davy confirmed the existence of alum and named the substance to Alumium (later changed to Aluminum). Aluminum has a very low-density that it is lighter than titanium and steel.
Titanium sputtering target is lightweight, strong, and resistant to corrosion, which makes it a very desirable material. Unfortunately, titanium is difficult to extract and process, which accounts for its higher price. It has good thermal conductivity, is non-magnetic, and non-toxic.
The aluminum sputtering target is an economical option that offers a good weight-to-strength ratio at a comparatively lower price. Aluminum is a reliable, strong metal with good corrosion resistance and high fracture toughness. Its abundance in earth and easy fabrication make its price down.
The sheet compares several properties between titanium sputter target and aluminum sputter target.
Titanium Target
Aluminum Target
Tensile Strength
From 3,000 psi to 200,000 psi
Aluminum doesn&#;t have a very high tensile strength In its pure form
Coefficient of Linear Thermal Expansion
8.6 x 10
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-6
K
-1
23.1 x 10
-6
K
-1
Melting Point
&#;
660.4 &#;
Boiling Point
&#;
&#;
Density
4.5 g·cm
&#;3
2.7 g.cm
-3
Thermal Conductivity
21.9 W m
-1
K
-1
235 W m
-1
K
-1
When considering your budget, the aluminum sputtering target is the more financial choice. Aluminum films can cost hundreds or thousands less than titanium films. However, titanium sputtering target is the clear winner for stiffness and strength, and it is ubiquitously used in top-level industries. Titanium films last years longer than aluminum films, making titanium target a good choice for the long term.
If you still hesitate to choose one from them, maybe titanium-aluminum alloy sputtering target is a good choice for you. These alloy sputter targets usually combine the advantages of titanium and aluminum but have a lower price than titanium.
Please visit Stanford Advanced Materials for more information. We are a global sputtering target manufacturer established in , and we offer all kinds of high purity film coating materials.